Hybride Phasenmaske

Hybrid phase-shift mask

Masque à décalage de phase hybride

Abstract

A method of forming a hybrid mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto a semiconductor substrate by use of an optical exposure tool. The method includes the steps of forming at least one noncritical feature on the mask utilizing one of a low-transmission phase-shift mask (pattern) and a non-phase shifting mask (pattern), and forming at least one critical feature on the mask utilizing a high-transmission phase-shift mask (pattern).

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Patent Citations (10)

    Publication numberPublication dateAssigneeTitle
    EP-0620498-A1October 19, 1994International Business Machines CorporationPhase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas
    EP-1122603-A1August 08, 2001Infineon Technologies AGPhase shifting mask
    US-5362591-ANovember 08, 1994Hitachi Ltd. Et Al.Mask having a phase shifter and method of manufacturing same
    US-5605775-AFebruary 25, 1997Matsushita Electronics CorporationPhotomask used by photolithography and a process of producing same
    US-5633102-AMay 27, 1997Intel CorporationLithography using a new phase-shifting reticle
    US-5795685-AAugust 18, 1998International Business Machines CorporationSimple repair method for phase shifting masks
    US-5807649-ASeptember 15, 1998International Business Machines Corporation, Lockheed Martin CorporationLithographic patterning method and mask set therefor with light field trim mask
    US-5858580-AJanuary 12, 1999Numerical Technologies, Inc.Phase shifting circuit manufacture method and apparatus
    US-5882827-AMarch 16, 1999Mitsubishi Denki Kabushiki KaishaPhase shift mask, method of manufacturing phase shift mask and method of forming a pattern using phase shift mask
    WO-9947981-A1September 23, 1999Asml Masktools Netherlands B.V.PROCEDE DE FORMATION DE DETAILS DE LIGNES INFERIEURS A 0,25 μ A L'AIDE DE MASQUES HAUTE TRANSMISSION A DEPHASAGE 'ATTENUE'

NO-Patent Citations (1)

    Title
    LEE F ET AL: "PROCESS FOR HYBRID PHASE-SHIFTING MASK FABRICATION" MOTOROLA TECHNICAL DEVELOPMENTS, MOTOROLA INC. SCHAUMBURG, ILLINOIS, US, vol. 18, 1 March 1993 (1993-03-01), pages 1-2, XP000349534

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