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  • Publication Date: December 31, 1969
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    US-2004074868-A1April 22, 2004Taiwan Semiconductor Manufacturing Co., Ltd.Tri-tone attenuated phase shift trim mask for double exposure alternating phase shift mask process
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    US-2005123837-A1June 09, 2005Matrix Semiconductor, Inc.Photomask features with interior nonprinting window using alternating phase shifting
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