masks (Total 4080 Patents Found)

Masks (4080 Patents Found)
A microphone signal attenuating breathing mask body having a gas port for inhalation of a gas to the wearer in a flow stream therethrough. A demand microphone is mounted to the mask and is coupled to an electromagnetic switch responsive to a predetermined magnetic field for switching from an actuation to an attenuation...
Process for dot-etching a photopolymer layer no more than 0.015 mm thick and O.D. greater than 3.0 in the 350 to 400 nm region containing tone correctable image comprised of polymeric dots and lines having hardened upper skin which rests on softer undervolume having less degree of polymerization or hardening wherein a ...
A set of at least two masks for the projection of structure patterns, coordinated with one another, by a projection system into the same photosensitive layer of a semiconductor wafer can include a second mask....
A method of designing an optical photomask includes providing a target pattern, correcting the target pattern with an OPC model, adjusting the target pattern and/or the OPC model, and correcting a first corrected pattern. The target pattern indicates a target shape of a pre-pattern opening in a photoresist layer on a s...
An apparatus for automatically detecting pinholes and spots in an integrated circuit photographic mask. The photographic mask is scanned by a television-type camera through a microscope to detect imperfections. Signals representing the imperfection are processed in logic circuitry....
A method and apparatus is provided for producing a smooth closed curve from a binary mask such as the type produced when segmenting various parts of a human body. Points defining the segmentation boundary are transformed into a set of polar coordinates. The set of coordinates is thresholded and averaged, and then smoot...
The invention concerns a method for repairing transmission masks. After the mask has been inspected and the position coordinates of the mask openings have been stored, these position coordinates are compared with the position coordinates of the desired mask pattern to determine the location of defects. The mask to be r...
An arrangement for projection copying of masks onto a workpiece, in particular onto a semiconductor substrate for producing integrated circuits, wherein the images of the patterns of the masks are formed by a projection lens on a photosensitive layer on the workpiece. The projection lens is completely corrected at the ...
A system for inspecting lithography masks utilizing a laser source to produce a coherent electromagnetic radiation pulse. The pulse is passed to a target which creates a plasma resulting in an extreme ultraviolet (EUV) beam. The beam is condensed and passed through an aperture to define a cross-sectional area of the co...
A system, method and computer-readable media for providing a reservation mask for compute resources such as a cluster or a grid. The method aspect comprises identifying a need type and a group of available resources, creating a reservation mask over the identified group of resources and if a request from a consumer mat...
Processing techniques are disclosed for batch fabrication of microstructures comprising an oxide mask on a substrate with submicron openings formed therein, and microstructures having deep-submicron, high aspect-ratio etched trenches, using conventional optical photolithography. Exemplary high aspect-ratio etched-trenc...
A method and a test-structure for determining an offset between lithographic masks are described. In one embodiment, an image of a first mask is provided in a patterning layer on a substrate. The image of the first mask comprises a first set of lines, each line separated by a distance D. An image of a second mask is th...
Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is select...
A novel dual beam low energy electron microscope (LEEM) apparatus for inspecting semiconductor circuits or masks. Direct imaging records many pixels in parallel, offering higher inspection rates than prior art scanning methods. A low energy flood beam is superimposed with a second, higher energy flood beam. The use of ...
A system for monitoring and controlling aperture etching in an alternating aperture phase shift mask (170, 270, 370, 722) is provided. The system includes one or more light sources (744, 762, 844), each light source (744, 762, 844) directing light to one or more apertures (150, 160, 250, 260, 350, 360, 430, 504, 506, 5...
An at-wavelength system for extreme ultraviolet lithography mask blank defect detection is provided. When a focused beam of wavelength 13 nm is incident on a defective region of a mask blank, three possible phenomena can occur. The defect will induce an intensity reduction in the specularly reflected beam, scatter inco...
Masks for microlithography apparatus, methods for making such masks, and methods for exposing photosensitive materials to form arrays of microfeatures on semiconductor wafers using such masks. In one embodiment, a method of making a mask comprises forming a mask layer on a substrate and identifying a first opening in t...
The invention relates to a device for pulsed laser deposition, which device comprises: a substrate mount with a substrate mounted thereon; a target mount with a target material mounted thereon and opposite of the substrate mount; a laser device for directing a laser beam on the target material; and a shadow mask arrang...
Masks for fabricating a semiconductor device and methods of forming mask patterns are provided which are capable of enhancing the breakdown voltage of the fabricated semiconductor device by accurately correcting a line width pattern error of a semiconductor substrate due to a mask error during a process for forming a w...
Systems and methods of performing a fused multiply add (FMA) operations are provided. In one embodiment, the length of the adder used by the FMA operation is less than 3*N, where N is the number of bits in the mantissa term of a floating point number. A mask may be used to perform the addition portion of the FMA operat...
L'invention concerne un procédé de préparation de membranes revêtues par catalyseur et d'ensembles électrodes à membranes destinés à être utilisés dans des piles à combustible au méthanol direct. Les couches cathode et anode sont formées par pulvérisation d'encres contenant un catalyseur sur u...
The activated charcoal filter layer for gas masks essentially is formed of superimposed, highly air-permeable surface structures with a layer of granular or spherical activated charcoal particles with a diameter of 0.1 to 1 mm affixed to them, and its pressure drop is less than 10 mm water column at a thickness of 4 cm...
A method for forming a self aligned pattern on an existing pattern on a substrate comprising applying a coating of the masking material to the substrate; and allowing at least a portion of the masking material to preferentially attach to portions of the existing pattern. The pattern is comprised of a first set of regio...
An appliance for warming or treating air for personal breathing. It has an upper face mask and a lower chest pad; and these units are connected by a flexible conduit. The chest pad is of cellular construction opening in the direction of the wearer''s body to receive heat from the same; and the face mask has inl...
A device and method for the interferometric measurement of phase masks, particularly from lithography. Radiation passing through a coherence mask is brought to interference by a diffraction grating. A phase mask is arranged in or near the pupil plane of the first imaging optics which can be positioned exactly in the x-...
The present invention relates to a novel and advantageous process for cleaning substrates, in particular masks and mask blanks. The process according to the invention is characterized by consecutive process steps comprising UV-treatment, fulljet cleaning, megasonic cleaning and DI (deionized) water cleaning. The proces...
Systems and methods are described that facilitate data communication in a wireless communication environment. According to various aspects, a node, such as an access point or an access terminal, may determine a number of channels over which it will transmit a communication signal. The node may then select channels base...
A display packaging assembly for swim masks and goggles which have corrective lenses. In a first preferred embodiment for a mask and a second preferred embodiment for a pair of goggles, the product is contained in a transparent plastic shell and is located on a mannequin face or face portion in a configuration which si...
Electrochemical Fabrication techniques are used to modify substrates or to form multilayer structures (e.g. components or devices) from a plurality of overlaying and adhered layers. Masks are used to selectively etch or deposit material. Some masks may be of the contact type and may be formed of multiple materials some...
A display device includes a layer of electroluminescent material which is capable of conducting electric current. The electroluminescent material is sandwiched between a pair of electrodes to which a voltage is to be applied to excite the electroluminescent material to luminescence. The display device is manufactured b...
Phase-shifting (two-optical-level) masks are manufactured by a self-aligned technique in which after first-level trenches in the mask have been formed, second-level trenches therein are formed by patterning an electron resist overlying the mask in such a manner that the edges of the patterned resist can be located anyw...
A stencil or scatterer mask for use with charged particle beam lithography such as projection electron-beam lithography comprises a membrane layer of a material having a Young's modulus of at least about 400 GPa and support struts supporting a surface of the membrane. The struts form and surrounding a plurality of ...
A circuit pattern printing system includes alignment apparatus (71) which is located remote from a printer (35). The alignment apparatus includes a means for displaying a cursor (69) on a video screen (101). The cursor identifies a desired position of a fiducial mark (61) printed on a substrate (106) when the substrate...